SensArray® Automation Package for In Situ Process Management
KLA's SensArray® products offer a cutting-edge solution for in situ monitoring of process tools' environments and wafer handling conditions in advanced packaging and assembly processes. The SensArray products utilize wireless sensor wafers and an automation package to provide comprehensive data on wafer temperature and handling. This data is instrumental in allowing engineers to visualize, diagnose, and control process conditions during advanced packaging manufacturing scenarios.
HighTemp-400: Monitoring Wafer Temperature in Advanced Processes
The HighTemp-400 in situ wafer temperature measurement system is designed to optimize and monitor advanced film processes, such as ALD, CVD, and PVD, supporting both FEOL and BEOL applications. By offering real-time temperature data, the HighTemp-400 allows IC manufacturers to assess thermal uniformity in various applications, crucial for optimizing new materials, transistor technologies, and complex patterning techniques that can impact overall performance.
CryoTemp™: Enhancing Control in Vacuum Process Conditions
The CryoTemp™ wafer temperature measurement system supports the monitoring of dry etch processes under vacuum conditions. With precise sensors and an operational range from -40°C to 30°C, the CryoTemp enables fast characterization and control of plasma etch chambers, leading to reduced downtime, improved tool performance, and enhanced productivity in manufacturing environments.
Smartwafer™: Monitoring Wafer Handling Integrity
The Smartwafer2™ handling monitor not only records vibrations and accelerations during wafer handling but also performs mechanical testing to identify potential issues in equipment alignments. By comparing data against historical benchmarks, the Smartwafer2 can pinpoint defects or mechanical problems that might compromise wafer integrity, offering a proactive solution to prevent defects or scratches in the production process.
EWG Wafer™ and RH Wafer™: Advanced Wafer Handling Monitoring
The EWG Wafer™ measures eccentricity and wobbling of wafers on spinning chucks, eliminating the need for time-consuming manual checks. On the other hand, the RH Wafer™ monitors relative humidity in tool chambers, vital for maintaining optimal process conditions. Both systems are compatible with Automation Loadport for automated use, adhering to SEMI standards for reliability and efficiency.
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