Innovative Capabilities for Custom/Analog Designs at 22nm and Below

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Innovative Capabilities for Custom/Analog Designs at 22nm and Below - Cadence Virtuoso

Advanced Node Solutions Overview

Designing at 22nm and below advanced nodes presents unique challenges due to the intricate interdependence of manufacturing, variability, power, and performance requirements. Components like multiple-patterning technology (MPT), color-aware physical design, layout-dependent effects (LDE), and density-gradient effects (DGE) add complexity. Custom routing, increasing physical design rules, and device variation sensitivity contribute to the intricate nature of designs at these nodes.

Key Benefits for Advanced Nodes

Cadence Virtuoso offers improved design productivity at advanced nodes, enhancing time-to-market goals. The solution scales to numerous simulations, meeting aggressive process challenges with automation techniques boosting productivity by up to 10X compared to traditional tools. Design migration capabilities facilitate the reusability of experience, preventing costly respins through collaboration with major foundries for upfront process variability management.

Features and Methodologies

The solution incorporates industry-leading methodologies to tackle design challenges at advanced-node processes. It includes enhancements like multi-threaded core editing for scalability, schematic PCell caching for faster netlisting, multi-gridded assisted placement, abstracted matched device arrays, simulation-driven wire creation, signoff quality DRC, and parasitic verification. Integrated placement and routing methodologies offer fully automated layout creation, custom constraint support, and migration solutions for seamless transition between advanced nodes.

Technologies and Resources

Cadence Virtuoso provides custom design migration capabilities, enabling a quick start for new advanced-node designs by leveraging previous experience. Integrated place and route technologies accelerate layout creation. Additionally, resources like design readiness for leading foundries, multi-patterning technologies within the Virtuoso environment, and solutions to avoid density gradient effects offer comprehensive support for custom/analog designs at 22nm and below.

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