Revolutionizing Semiconductor Productivity with the ASML Twinscan NXT:2050i

KB at your finger tips

This is one stop global knowledge base where you can learn about all the products, solutions and support features.

Products-ASML Twinscan

Revolutionizing Semiconductor Productivity with the ASML Twinscan NXT:2050i

High Productivity for Semiconductor Production

The ASML Twinscan NXT:2050i is a cutting-edge immersion lithography system that is specifically designed for high-volume production of 300 mm wafers at advanced nodes. With a focus on productivity, this system can churn out an impressive 295 wafers per hour, pushing the boundaries of efficiency in semiconductor manufacturing. By significantly reducing overhead times compared to previous models, it offers a substantial increase in daily wafers produced, providing a remarkable boost to manufacturing output.

Advanced Optics Enhancing Resolution and Accuracy

Featuring a state-of-the-art 1.35 NA 193 nm catadioptric projection lens, the ASML Twinscan NXT:2050i delivers unparalleled optics performance. With the ability to achieve production resolutions as low as 40 nm (C-quad) and 38 nm (dipole), this system ensures exceptional imaging quality. Furthermore, the lens elements are equipped with manipulators to correct optical aberrations, maximizing productivity for low-k1 imaging. The system also integrates a Parallel ILIAS (PARIS) sensor for precise measurement of optical aberrations throughout the projection slit, enabling enhanced alignment, reticle heating correction, and lens heating correction.

Superior Imaging Performance and Enhanced Reliability

The ASML Twinscan NXT:2050i excels in imaging performance, allowing for an impressive 2.5 nm cross-matching on product overlay in conjunction with extreme ultraviolet (EUV) NXE systems. The system's reticle stage is equipped with improved clamps, enhancing reliability and overlay precision. Additionally, the ORION alignment sensor offers increased accuracy in alignment measurements and process robustness, with future upgradability to a 12-color mode. The inclusion of a level sensor (UVLS-2) utilizing ultraviolet light ensures minimized sensitivity to process stack variations during in-line mapping, leading to greater leveling accuracy along the wafer's edge.

Stay Ahead in Today’s Competitive Market!
Unlock your company’s full potential with a Virtual Delivery Center (VDC). Gain specialized expertise, drive seamless operations, and scale effortlessly for long-term success.

Book A Meeting To Setup A VDC

ASML Twinscan NXT:2100i: Enhancing Chipmaking Precision with Cutting-Edge Lithography Technology

Introduction to TWINSCAN NXT:2100i

The ASML Twinscan NXT:2100i represents a revolutionary advancement in the field of lithography systems, offering unparalleled precision and efficiency in chip manufacturing. As the successor to the TWINSCAN NXT:2050i, this dual-stage immersion lithography system is equipped with state-of-the-art hardware and software innovations that significantly enhance overlay accuracy. The system provides improved single-machine overlay by up to 10% (0.9 nm) and matched-machine overlay by 13% (1.3 nm), setting a new standard in chipmaking technology.

Read article

ASML Twinscan Metrology and Inspection Systems: Ensuring High Chip Manufacturing Yield and Performance

YieldStar Optical Metrology Solutions

ASML Twinscan's YieldStar optical metrology solutions are tailored for the semiconductor industry to effectively measure the quality of patterns on a wafer. These solutions offer fast and accurate measurements, crucial for ensuring high chip manufacturing yield and performance. By providing real-time data on pattern quality, chipmakers can monitor and optimize the post-etch process, resulting in improved chip production efficiency.

Read article

Revolutionizing Semiconductor Manufacturing with ASML Twinscan NXT:1980Fi

Introduction to TWINSCAN NXT:1980Fi

The ASML Twinscan NXT:1980Fi is a cutting-edge dual-stage ArF immersion lithography system that redefines semiconductor manufacturing. This advanced system is specifically designed to print mid-critical chip layers on 300 mm wafers with unparalleled throughput, making it an essential tool for chipmakers operating in both advanced and mature semiconductor nodes.

Read article

Revitalizing ASML Twinscan: Refurbished Systems for Enhanced Performance

Introduction to Refurbished ASML Lithography Systems

ASML is dedicated to extending the life and purpose of their classic PAS 5500 and TWINSCAN lithography systems by undergoing a meticulous refurbishment process. These systems, known for their longevity, are refurbished at the Linkou Factory. Engineers in blue cleanroom suits intricately disassemble the machines, inspect, repair, and fine-tune them back to their original specifications. The refurbishment process involves dismantling the machines into modules, individually repairing and testing them, and finally reassembling them to create a like-new machine that meets the original performance standards.

Read article

Revolutionizing Semiconductor Manufacturing with ASML Twinscan Lithography Solutions

ASML: Leading the Semiconductor Industry

ASML, a pioneer in the semiconductor industry, offers a comprehensive lithography product portfolio that drives affordable scaling for its customers. The integration of lithography systems, computational lithography software, and metrology and inspection products enables chipmakers to mass produce patterns on silicon efficiently, increasing chip value while reducing costs.

Read article

Welcome to Knowledge Base!

KB at your finger tips

Products-ASML Twinscan