Revolutionizing Semiconductor Production with ASML's TWINSCAN XT:860M

KB at your finger tips

This is one stop global knowledge base where you can learn about all the products, solutions and support features.

Products-ASML Twinscan

Revolutionizing Semiconductor Production with ASML's TWINSCAN XT:860M

High Productivity for Volume Production

ASML's TWINSCAN XT:860M is a cutting-edge step-and-scan system specifically designed for high-productivity volume production of 300 mm wafers at resolutions of 110 nm and below. By leveraging advanced optics and technology, this system offers exceptional throughput, enabling the processing of 240 300 mm wafers per hour at a low operational cost. The use of highly line-narrowed 40 W KrF lasers with variable frequency control, along with innovative optical transmission capabilities, ensures efficient and cost-effective production.

Optimized Optics for Precision Performance

The TWINSCAN XT:860M features a state-of-the-art optical system that includes a variable 0.80 NA 248 nm 860+ projection lens, delivering exceptional imaging performance with minimal aberrations and distortion. This system provides tight focal planes and precise control over image distortion, guaranteeing high-quality output. Moreover, the system incorporates AERIAL II Illuminator technology, allowing for continuous-variable conventional and off-axis illumination, enhancing imaging accuracy and flexibility.

Superior Imaging Performance and Overlay Control

ASML's TWINSCAN XT:860M excels in imaging performance, achieving remarkable overlay control with a ≤ 12 nm single-machine full-wafer-coverage overlay and a ≤ 14 nm matched-machine full-wafer-coverage overlay. This level of precision is enabled by the system's LithoGuide ILIAS sensor, which facilitates accurate system setup and monitoring of imaging parameters. With its cutting-edge technology and advanced capabilities, the TWINSCAN XT:860M empowers semiconductor manufacturers to achieve unparalleled levels of accuracy and productivity in their production processes.

Stay Ahead in Today’s Competitive Market!
Unlock your company’s full potential with a Virtual Delivery Center (VDC). Gain specialized expertise, drive seamless operations, and scale effortlessly for long-term success.

Book A Meeting To Setup A VDC

Revolutionizing Semiconductor Production with ASML Twinscan NXT:870

High Productivity and Precision

ASML's TWINSCAN NXT:870 incorporates state-of-the-art optics and the latest NXT platform technology to deliver exceptional performance in semiconductor lithography. With a resolution capability of 110 nm and below, this system is optimized for volume production of 300 mm wafers. The integration of a dual-stage KrF light source ensures precise and efficient operation, allowing for the production of up to 330 300-mm wafers per hour. The utilization of highly line-narrowed 40 & 60 W KrF lasers, coupled with advanced optical transmission, guarantees high productivity at a low operational cost.

Read article

ASML Twinscan XT:1460K - Empowering High-Productivity Lithography Solutions

High-Productivity Lithography Tool

The ASML Twinscan XT:1460K stands out as a high-productivity dry ArF lithography tool, offering exceptional overlay and imaging performance for volume production at a resolution of 65 nm. This 193 nm step-and-scan system is specifically designed for volume 300 mm wafer production, equipped with a variable 0.93 NA 193 nm projection lens with advanced lens manipulators. The tool's dual wafer-stage technology allows for the exposure of one wafer while aligning the next in parallel, reducing overhead time and enabling continuous patterning for maximum productivity.

Read article

Revolutionizing Lithography with ASML Twinscan XT:1060K

Advanced Lithography Technology for Enhanced Productivity

ASML's TWINSCAN XT:1060K is a cutting-edge KrF laser 'dry' lithography system, offering unparalleled performance in the industry. This 248 nm step-and-scan system boasts dual-stage lithography capabilities, delivering the highest numerical aperture (NA) and productivity for 300 mm wafer production. By leveraging critical KrF technology, this system significantly reduces the cost per layer for customers while harnessing the benefits of mature KrF processing.

Read article

Enhancing User Experience with ASML Twinscan Cookie Management

Understanding Cookies and Their Functionality

Cookies play a vital role in enhancing user experience on websites. ASML Twinscan utilizes cookies as small text files that are sent to your browser. These files enable various features and functionality on the website by 'remembering' your actions and preferences over time. Session-based cookies are temporary and are automatically deleted when you close your browser, while persistent cookies last until they are deleted or expire. ASML Twinscan uses both first-party and third-party cookies, enhancing user interaction and customization on the website.

Read article

ASML Twinscan SupplierNet Portal: Empowering Supplier Collaboration and Responsible Supply Chain Practices

Welcome to SupplierNet

ASML Twinscan SupplierNet is a secure portal exclusively designed for ASML's suppliers, providing them with a streamlined platform for effective collaboration and communication. By logging in to SupplierNet, suppliers can access dedicated portals and relevant information tailored to their specific needs. This centralized hub enhances operational efficiency and ensures timely access to key resources.

Read article

Welcome to Knowledge Base!

KB at your finger tips

Products-ASML Twinscan