Revolutionizing Lithography with ASML Twinscan XT:1060K

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Revolutionizing Lithography with ASML Twinscan XT:1060K

Advanced Lithography Technology for Enhanced Productivity

ASML's TWINSCAN XT:1060K is a cutting-edge KrF laser 'dry' lithography system, offering unparalleled performance in the industry. This 248 nm step-and-scan system boasts dual-stage lithography capabilities, delivering the highest numerical aperture (NA) and productivity for 300 mm wafer production. By leveraging critical KrF technology, this system significantly reduces the cost per layer for customers while harnessing the benefits of mature KrF processing.

Ideal for Advanced Applications

The XT:1060K is specifically designed for metal, via, and implant layers at the 2X nm technology node and beyond, catering to both Memory and Logic applications. With imaging matching to other TWINSCAN KrF systems and outstanding overlay matching to TWINSCAN ArF and KrF systems, seamless integration into high-volume manufacturing environments is achieved, ensuring efficiency and precision in production processes.

Key Features and Performance

1. Productivity: The system features highly line-narrowed 40 W KrF lasers with variable frequency control, coupled with high optical transmission, resulting in a production throughput of ≥ 205 300 mm wafers per hour with optimized operational costs. 2. Optics: Employing an innovative in-line catadioptric lens design, the XT:1060K supports a full 26 x 33 mm field, 4X reduction, and reticle compatibility, enhancing versatility and optical performance. The AERIAL-E Illuminator enables continuous-variable conventional and off-axis illumination with extended zoom capabilities, maintaining high throughput. 3. Imaging Performance: Equipped with the latest overlay enhancements, customers can achieve remarkable chuck overlay of ≤ 3.5 nm (full wafer) and a machine overlay of ≤ 5 nm (full wafer). The LithoGuide ILIAS ensures precise system setup and monitoring of imaging parameters, facilitating superior imaging performance.

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