ASML Twinscan XT:860N - State-of-the-Art Optics for High-Volume Wafer Production

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ASML Twinscan XT:860N - State-of-the-Art Optics for High-Volume Wafer Production

Productivity Boost with Advanced Laser Technology

The TWINSCAN XT:860N step-and-scan system by ASML leverages highly line-narrowed 40, 50, & 60 W KrF lasers with variable frequency control to enhance production throughput. This system can handle 260 300 mm (or 275 200 mm) wafers per hour, ensuring efficient operation at a low cost. By utilizing the UVLS LRL level sensor, productivity can be further increased to 260 wafers per hour, while enabling enhanced alignment mark collection for superior correction models. The AERIAL II Illuminator, coupled with the system's high-speed dual-stage technology, maintains optimal throughput levels across a broad range of resist sensitivities.

Precision Optics for Superior Imaging Performance

The TWINSCAN XT:860N features a variable 0.80 NA 248 nm 860+ projection lens, delivering exceptional imaging quality with minimal aberrations, tight focal planes, and superior distortion control, ensuring annular distortion is kept below 10 nm. This level of optical precision contributes to high-resolution imaging crucial for demanding applications in semiconductor manufacturing.

Leading Imaging Performance and Accuracy

With the TWINSCAN XT:860N, achieving a ≤ 7.5 nm matched-machine full-wafer-coverage overlay is standard. The system's LithoGuide ILIAS sensor enhances setup accuracy and allows users to monitor and fine-tune imaging parameters with precision. This unmatched imaging performance ensures superior quality in the fabrication of advanced semiconductor devices.

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Revolutionizing Semiconductor Production with ASML's TWINSCAN XT:860M

High Productivity for Volume Production

ASML's TWINSCAN XT:860M is a cutting-edge step-and-scan system specifically designed for high-productivity volume production of 300 mm wafers at resolutions of 110 nm and below. By leveraging advanced optics and technology, this system offers exceptional throughput, enabling the processing of 240 300 mm wafers per hour at a low operational cost. The use of highly line-narrowed 40 W KrF lasers with variable frequency control, along with innovative optical transmission capabilities, ensures efficient and cost-effective production.

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Revolutionizing Semiconductor Production with ASML Twinscan NXT:870

High Productivity and Precision

ASML's TWINSCAN NXT:870 incorporates state-of-the-art optics and the latest NXT platform technology to deliver exceptional performance in semiconductor lithography. With a resolution capability of 110 nm and below, this system is optimized for volume production of 300 mm wafers. The integration of a dual-stage KrF light source ensures precise and efficient operation, allowing for the production of up to 330 300-mm wafers per hour. The utilization of highly line-narrowed 40 & 60 W KrF lasers, coupled with advanced optical transmission, guarantees high productivity at a low operational cost.

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ASML Twinscan XT:1460K - Empowering High-Productivity Lithography Solutions

High-Productivity Lithography Tool

The ASML Twinscan XT:1460K stands out as a high-productivity dry ArF lithography tool, offering exceptional overlay and imaging performance for volume production at a resolution of 65 nm. This 193 nm step-and-scan system is specifically designed for volume 300 mm wafer production, equipped with a variable 0.93 NA 193 nm projection lens with advanced lens manipulators. The tool's dual wafer-stage technology allows for the exposure of one wafer while aligning the next in parallel, reducing overhead time and enabling continuous patterning for maximum productivity.

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Revolutionizing Lithography with ASML Twinscan XT:1060K

Advanced Lithography Technology for Enhanced Productivity

ASML's TWINSCAN XT:1060K is a cutting-edge KrF laser 'dry' lithography system, offering unparalleled performance in the industry. This 248 nm step-and-scan system boasts dual-stage lithography capabilities, delivering the highest numerical aperture (NA) and productivity for 300 mm wafer production. By leveraging critical KrF technology, this system significantly reduces the cost per layer for customers while harnessing the benefits of mature KrF processing.

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Enhancing User Experience with ASML Twinscan Cookie Management

Understanding Cookies and Their Functionality

Cookies play a vital role in enhancing user experience on websites. ASML Twinscan utilizes cookies as small text files that are sent to your browser. These files enable various features and functionality on the website by 'remembering' your actions and preferences over time. Session-based cookies are temporary and are automatically deleted when you close your browser, while persistent cookies last until they are deleted or expire. ASML Twinscan uses both first-party and third-party cookies, enhancing user interaction and customization on the website.

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