ASML Twinscan XT:1460K - Empowering High-Productivity Lithography Solutions

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ASML Twinscan XT:1460K - Empowering High-Productivity Lithography Solutions

High-Productivity Lithography Tool

The ASML Twinscan XT:1460K stands out as a high-productivity dry ArF lithography tool, offering exceptional overlay and imaging performance for volume production at a resolution of 65 nm. This 193 nm step-and-scan system is specifically designed for volume 300 mm wafer production, equipped with a variable 0.93 NA 193 nm projection lens with advanced lens manipulators. The tool's dual wafer-stage technology allows for the exposure of one wafer while aligning the next in parallel, reducing overhead time and enabling continuous patterning for maximum productivity.

Key Features & Benefits

The Twinscan XT:1460K boasts a standard 45 W ArF laser with variable frequency control, combined with high optical transmission, resulting in a production throughput of 205 wafers per hour on 300 mm wafers. The system's optics leverage a variable 0.65–0.93 NA Carl Zeiss Starlith 4X reduction lens, along with AERIAL-P illuminator technology, pushing the boundaries of ArF technology beyond the 65 nm technology node. Achieving a production resolution as low as 57 nm with polarized illumination, the machine offers excellent CD uniformity, outstanding overlay precision, and long-term stability in performance.

Enhanced Imaging Performance & Precision

With the latest overlay enhancements, the Twinscan XT:1460K can achieve a dedicated chuck overlay of ≤ 3.5 nm and a matched machine overlay of ≤ 5 nm when equipped with the TOP XT:1460K package. The off-line leveling system provides superior focus control across the entire wafer, including edge dies, allowing operation at extremely low-k1 values. This results in superior CD uniformity, industry-leading overlay precision, and stable long-term performance, making it a reliable choice for high-volume production processes.

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Revolutionizing Lithography with ASML Twinscan XT:1060K

Advanced Lithography Technology for Enhanced Productivity

ASML's TWINSCAN XT:1060K is a cutting-edge KrF laser 'dry' lithography system, offering unparalleled performance in the industry. This 248 nm step-and-scan system boasts dual-stage lithography capabilities, delivering the highest numerical aperture (NA) and productivity for 300 mm wafer production. By leveraging critical KrF technology, this system significantly reduces the cost per layer for customers while harnessing the benefits of mature KrF processing.

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Enhancing User Experience with ASML Twinscan Cookie Management

Understanding Cookies and Their Functionality

Cookies play a vital role in enhancing user experience on websites. ASML Twinscan utilizes cookies as small text files that are sent to your browser. These files enable various features and functionality on the website by 'remembering' your actions and preferences over time. Session-based cookies are temporary and are automatically deleted when you close your browser, while persistent cookies last until they are deleted or expire. ASML Twinscan uses both first-party and third-party cookies, enhancing user interaction and customization on the website.

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ASML Twinscan SupplierNet Portal: Empowering Supplier Collaboration and Responsible Supply Chain Practices

Welcome to SupplierNet

ASML Twinscan SupplierNet is a secure portal exclusively designed for ASML's suppliers, providing them with a streamlined platform for effective collaboration and communication. By logging in to SupplierNet, suppliers can access dedicated portals and relevant information tailored to their specific needs. This centralized hub enhances operational efficiency and ensures timely access to key resources.

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ASML Twinscan Customer Support Solutions and Services

24/7 Support for Uninterrupted Operations

ASML Twinscan offers comprehensive 24/7 support to ensure that their customers' systems run smoothly without any downtime. With thousands of systems in customer fabs globally, the dedicated service engineers work tirelessly to prevent any unscheduled downtime, which could cost customers significant amounts per minute. By utilizing deterministic diagnostics and predictive methods, ASML optimizes maintenance and upgrades in collaboration with customers' production schedules to prevent disruptions. The company's adherence to global ISO 9001:2015 certification guarantees quality in all processes, reflecting their commitment to excellence and reliability.

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ASML Twinscan: Revolutionizing Microchip Manufacturing with EUV Lithography

The Power of EUV Lithography

ASML Twinscan's NXE and EXE systems utilize extreme ultraviolet (EUV) light to enable the production of high-resolution microchips crucial for powering today's advanced technologies. By harnessing light with a wavelength of just 13.5 nm - nearly X-ray level - EUV lithography pushes the boundaries of Moore's Law, facilitating the creation of cutting-edge transistor designs and chip architectures.

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