ASML Twinscan NXT:1470 - Revolutionizing Lithography with Unprecedented Throughput and Precision

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ASML Twinscan NXT:1470 - Revolutionizing Lithography with Unprecedented Throughput and Precision

Introduction to TWINSCAN NXT:1470

The TWINSCAN NXT:1470 193 nm step-and-scan system by ASML represents a groundbreaking advancement in lithography technology. It stands as the industry's most productive lithography platform, surpassing the milestone of 300 wafers per hour. What sets this system apart is its dry lithography design, a first for ASML, built on the high-productivity and high-precision NXT platform. This dry system achieves remarkable on-product overlay performance better than 4.5 nm, setting a new standard in lithography capabilities.

Key Features & Benefits

The TWINSCAN NXT:1470 offers exceptional overlay and throughput performance, empowering chip manufacturers to reduce the cost per exposure while increasing wafer output by up to 50% within the same lithocell footprint. This dual-stage ArF lithography tool paves the way for enhanced cost efficiency in chip production, coupled with improved machine overlay for superior yields. The system's productivity is amplified by the NXT body, featuring a new generation of wafer stage modules, resulting in up to 50% greater throughput compared to previous ASML systems.

Optical Advancements

The TWINSCAN NXT:1470 is equipped with a variable-NA Carl Zeiss Starlith 4X reduction lens, offering a versatile NA range of 0.70 to 0.93. This system integrates enhanced optics, including an additional lens element and improved lens heating control, distinguishing it from previous dry ArF lithography systems. These optical enhancements contribute to superior imaging and overlay precision, enabling the system to achieve on-product overlay below 4.5 nm while processing over 300 wafers per hour.

Advanced Imaging Performance

Built on the NXT high-throughput and high-precision system architecture, the TWINSCAN NXT:1470 showcases improved wafer stages, handlers, and polarized illumination. With the inclusion of the latest UV level sensor, this system can achieve production resolutions down to 57 nm, ensuring superior focus control across the entire wafer, particularly for edge dies. The cutting-edge technology embedded in the NXT:1470 elevates lithography to new levels of performance and efficiency.

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ASML Twinscan: Revolutionizing Chip Manufacturing with Immersion Lithography

Immersion Systems Leading the Industry

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ASML Twinscan CustomerNet: Streamlining Support and Solutions for ASML Customers

Registering for CustomerNet

CustomerNet is ASML's secure online portal designed exclusively for registered ASML customers. By registering for CustomerNet, users gain access to a plethora of tailored product and service documentation, including release bulletins, spare parts lists, training programs, and more. This comprehensive repository of information serves as a one-stop solution for customers seeking detailed and up-to-date resources related to their ASML equipment. To register for CustomerNet, users simply need to click on the provided link and have the name of their ASML account manager ready.

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