Productivity Boost with Advanced Laser Technology
The TWINSCAN XT:860N step-and-scan system by ASML leverages highly line-narrowed 40, 50, & 60 W KrF lasers with variable frequency control to enhance production throughput. This system can handle 260 300 mm (or 275 200 mm) wafers per hour, ensuring efficient operation at a low cost. By utilizing the UVLS LRL level sensor, productivity can be further increased to 260 wafers per hour, while enabling enhanced alignment mark collection for superior correction models. The AERIAL II Illuminator, coupled with the system's high-speed dual-stage technology, maintains optimal throughput levels across a broad range of resist sensitivities.